Field Emission Auger Microprobe JAMP 9500F
(JEOL, Japan)
Auger Microprobe JAMP 9500F has the worlds highest spatial resolution to date. Its high performance electron optical system allows to achieve the minimum probe diameter of 3 nm in Secondary Electron Image (SEI) mode and 8 nm for Auger analysis mode. It allows surface image observation using high resolution SEI, Auger image analysis and line profile analysis. This instrument can perform depth profile analysis while employing ion etching. Moreover, a new neutralizing ion gun makes Auger analysis of insulating materials possible. Auger Microprobe JAMP 9500F is equipped with Energy Dispersive X-ray Spectrometer INCA PentaFETx3 (Oxford Instruments, UK) and Microfocus X-ray Tube with Capillary Optics µIFG iMOXS (Institute for Scientific Instruments, Germany). Its main components are shown in Fig below.
Available Techniques:
High Resolution Scanning Electron Microscopy (Secondary Electron Image Mode, 3 nm;
Backscattered Electron Image Mode, 6 nm);
Local Auger Electron Spectroscopy;
Electron Probe X-ray Microanalysis;
micron-X-ray Fluorescence Analysis.
Main Auger Microprobe JAMP-9500Fs features include:
Electron gun accelerating voltage from 0.5 to 30 kV;
Secondary electron image mode resolution 3 nm;
Backscattered electron image mode resolution 8 nm;
Probe diameter for Auger analysis 8 nm;
Magnification from 20 to 500 000 times;
Auger analyzer type hemispherical electrostatic energy analyzer;
Detection system multi-channel detection (7 channels);
Energy resolution 0.05 to 0.6 ;
Sensitivity 840 000 cps/7 ch;
Energy resolution of X-ray energy dispersive spectrometer - 126 eV at MnKα
Analyzed element range from B;
Energy range up to 40 kV;
High voltage of microfocus X-ray tube up to 50 kV;
X-ray beam minimal diameter -120 micrometer.
Types of researches, which we provide:
High resolution sample surface imaging (3 nm);
Auger-electron spot analysis (minimal diameter about 8 nm);
Auger-electron line profile analysis;
Auger-electron mapping with spatial resolution about 8 nm;
Auger-electron depth profile analysis;
Surface and layers chemical state analysis;
X-ray electron probe spot microanalysis;
X-ray electron probe mapping analysis;
µ-X-ray fluorescence spot analysis (minimal diameter about 120 micrometer).